Premier Control Technologies Fluid Solutions
From ALD/CVD thin‑film growth and graphene/2D materials to RIE/etch and nanoparticle synthesis, nanotechnology workflows depend on repeatable gas delivery and stable pressure at ultra‑low flows — often under vacuum and with pulsed steps lasting milliseconds. Small deviations can shift stoichiometry, change grain size, or cause non‑uniform layers across wafers or chips—directly impacting yield and device performance.
Premier Control Technologies supports research labs, universities, pilot lines and fabs across the UK with application engineering, rapid supply and service for Alicat Scientific mass flow and pressure instruments, as well as Equilibar precision back pressure regulators.
ALD precursors and carrier gases frequently run in the sccm to sub sccm regime. Maintaining setpoint at these flows—despite temperature or downstream pressure changes—is critical for cycle to cycle repeatability.
Processes require rapid step changes and short pulses; controllers must settle quickly without overshoot to avoid parasitic reactions or non uniform monolayers.
R&D tools often switch between N₂, Ar, O₂, H₂ and specialty/reactive gases. Changing mixes and ranges without re plumbing or lengthy recalibrations saves precious tool time.
Roughing/pumping events and fast valve actuations cause back pressure fluctuations that disrupt mass flow accuracy and film uniformity unless actively controlled.
Cleanroom environments demand low outgassing, high leak integrity and wetted materials compatible with reactive or corrosive gases.
Researchers need high rate digital data, totalisation, and straightforward integration with PLCs, LabVIEW, Python or MATLAB to accelerate experiments.
Alicat’s laminar differential pressure technology with integrated temperature/pressure sensing delivers fast control response and wide turndown suited to nanotech applications.
For direct chamber or line pressure control, Alicat pressure controllers maintain a stable setpoint from vacuum through positive pressure, coordinating seamlessly with mass flow controllers to keep flow/pressure coupling in check during recipe transitions.
Where extremely stable downstream pressure is required—especially at very low flows, mixed phases, or with aggressive chemistries—Equilibar BPRs provide exceptional resolution and responsiveness. Their multi orifice diaphragm design maintains setpoint with minimal hysteresis, making them ideal in:
Pair an Alicat electronic pressure controller as the pilot with an Equilibar dome loaded BPR to achieve high bandwidth, high resolution back pressure control from deep vacuum to positive pressure. This combo damps transients, improves ALD/CVD repeatability and protects delicate substrates by avoiding pressure spikes.
Tell us about your process (ALD, CVD, RIE, microreactor) and target flow/pressure ranges. We'll size an Alicat MFC/PC and, where needed, an Equilibar BPR for a stable, scalable solution. Please email us at sales@pctflow.com or call 01953 609930.
01953 609930
