Semiconductor

In the fast-moving world of semiconductor manufacturing, precision and reliability are everything. Alicat’s mass flow and pressure controllers are designed to support key processes like ALD, CVD, PECVD and DRIE, helping to improve repeatability and throughput. With fast response times and accurate control, these instruments integrate easily into existing equipment and automation systems. They support a wide range of gases, including custom blends, and provide real-time feedback through simple, user-friendly interfaces. Each device comes fully calibrated and backed by a strong warranty, giving engineers the confidence they need to keep production running smoothly and within specification.

Their compatibility with high-purity and corrosive gases makes them ideal for cleanroom environments, while flexible communication options such as EtherNet/IP and DeviceNet simplify integration into factory networks. Alicat’s rapid delivery and responsive support also help minimise downtime during tool upgrades or maintenance.

Processes commonly being supported by Alicat instruments include:

• Atomic Layer (ALD)
• Chemical Vapour Deposition (CVD)
• Plasma Enhanced Chemical Vapour Deposition (PECVD)
• Deep Reactive Ion Etching (DRIE)

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