Common Problems in Vacuum Systems
Vacuum coating, ALD/CVD, and research chambers demand stable gas flow and pressure control under extreme conditions. Typical issues include:
- Flow instability at low pressures: Conventional MFCs struggle to maintain accuracy when upstream pressure drops during pump downs.
- Overshoot during recipe changes: Slow response times cause pressure spikes, risking contamination or film defects.
- Leak integrity concerns: Backstreaming through controllers compromises vacuum purity.
- Pressure drift from supply regulators: Inconsistent inlet pressure reduces MFC accuracy and repeatability